Vapor deposition device with traveling mask



June 27, 1967 A. J. KERECMAN VAPOR DEPOSITION DEVICE WITH TRAVELING MASK Filed March 4, 1966 ALBER INVENTOR,

T J KERECMAN United States Patent 3,327,683 VAPOR DEPOSITION DEVICE WITH TRAVELING MASK Albert J. Kerecman, Wayside, NJ. (748 Bowue Road, Asbury Park, NJ. 07712) Filed Mar. 4, 1966, Ser. No. 534,289 2 Claims. (Cl. 118-49) This invention relates in general to apparatus suitable for use in vacuum deposition techniques and in particular, to an apparatus for vacuum depositing multiple-layer thin fihns on a film receiving member.

The general object of this invention is to provide an apparatus suitable for carrying out the vacuum deposition of multiple layer thin films on a film receiving member. A more particular object of this invention is to provide an apparatus that will allow the simultaneous deposition of conductor material and insulating material on a film receiving member so that a true multi-layered structure, as alternate layers of winding and insulation, can be built 11 It has now been found that the aforementioned objective can be attained by providing an apparatus as hereinafter described. According to the invention, the apparatus includes an evacua-ble container with suitable means for evacuating the container. A film receiving member is rotatably mounted within the container. A plurality of discrete chambers are spaced from the film receiving member. Each of the chambers contains a vapor generating source and also includes a duct so positioned that vapors generated in the chamber are directed toward the film receiving member. The apparatus also includes an aperture shield intermediate each of the chambers and the film receiving member. Further, means are provided for both simultaneously rotating the film receiving member and moving the apertured shield parallel to the longitudinal axis of the member whereby vapor passing through the aperture of the shield condenses as a film on the film receiving member.

The invention can best be understood by referring to the drawing wherein:

PEG. 1 is a top plan view of the apparatus according to one embodiment of the invention, and

FIG. 2 is a sectional view, partly in elevation, of the apparatus according to one embodiment of the invention.

Referring now to FIGS. 1 and 2, the apparatus includes an evacuable container mounted on a base plate 12. Extending below base plate 12. is a suitable conventional evacuation means generally indicated as 14. A film receiving member 16, preferably cylindrical, is rotatably mounted within the container 10 by any suitable conventional means that are not shown and do not constitute any part of the invention. Spaced from the film receiving member 16 are upwardly extending chambers 18 and 18a. Within each of the chambers there is provided a vapor generating source (not shown) and each chamber is also provided with open ended ducts 20 and 20a, respectively, so arranged that Vapors generated in the chambers 18 and 18a respectively are directed toward the surface of member 16 through the opening in the ducts. A shield 22 having respective apertures 24 and 24a aligned with the duct openings is positioned intermediate each of the chambers 18 and 18a and film receiving member 16. The shield 22 is adapted to move on rails 26 and 26a along the longitudinal axis of member 16. Although a single shield has been shown in the drawing, more than one shield can be used in the invention; the

Patented June 27, 1967 additional shield being positioned intermediate any additional vapor producing chamber and the film receiving member. As shown in FIG. 1, the apertures in the shield are offset longitudinally to provide alternate film layers along the axis of the film receiving member. A motor driven means 28 is further provided for simultaneously rotating the film receiving member 16 and activating the shield 22 along the rails 26 and 26a.

The operation of the apparatus of the invention in preparing a thin inductor is described in the following example.

A manganese-silver contact is first deposited on a cylindrical quartz substrate /2 inch in diameter under vacuum in such a manner that the contact will be in alignment with the subsequently deposited multiple layer thin films. The cylindrical quartz substrate or film receiving member 16 is then placed in the evacuable container 10 and the container 10 is sealed and then evacuated by suitable conventional means as illustrated at 14 to a pressure of about 5X10 mm. of mercury. Chambers 18 and 18a are then heated to their respective evaporation points. Chamber 18 in this example yields lead vapor from an ingot of lead contained in a tantalum, tungsten, or molybdenum boat. Chamber 18a in this example yields silicon monoxide vapor from silicon monoxide contained in a molybdenum or tungsten boat. As the vapors issue through the openings of respective ducts 20 and 20a, the cylindrical quartz substrate or film receiving member 16 is axially rotated simultaneously with axial movement of the shield 22 as hereinbefore described. The shield 22 in this example is made of stainless steel, with apertures 24 and 24a respectively therein being inch in diameter and with the clearance between the shield and the cylindrical quartz substrate 16 being inch. The shield 22 moves axially on rails 26 and 26a parallel to the longitudinal axis of the rotating cylindrical quartz substrate 16. The movement is so regulated that alternate layers of conductive lead film and dielectric silicon monoxide film may be deposited on the cylindrical quartz substrate 16. Thereafter, the rotating and shield moving motor driven means 28 is stopped and the cylindrical quartz substrate bearing the multi-layered alternating lead-silicon monoxide films removed from container 10. Fabrication of the thin film inductor is then completed by depositing another manganese-silver contact.

Variations of the apparatus as described in the aforementioned example are to be considered as coming within the scope of the invention. For example, more than two vapor sources could be used. Similarly, a sputtering source could be employed instead of the vacuum evaporation system shown. Then too, multi-apertured shields could be used or rectangular slits used as the apertures, all depending on the effect desired. Moreover, the motor driven means can be so arranged that the shield be engaged or disengaged at any time during the rotation of the film receiving member.

The thin films produced by the apparatus of the invention are in the order of 1000 to 10,000 angstroms in thickness. The speed of rotation of the film receiving member and the movement of the shield can be varied according to the particular deposition efi'ect desired.

The foregoing description is to be considered merely as illustrative of the invention and not in limitation thereof.

What is claimed is:

1. An apparatus for vacuum depositing multiple layers of thin films in the order of 1000 to 10,000 angstroms in thickness comprising an evacuated container, a film receiving member axially and rotatably mounted within said container, a plurality of vapor generating sources spaced from said film receiving member for generating vapors adapted to be deposited on said film receiving member as solid layers, each of said vapor generating sources terminating in an open ended duct directed toward and coextensive with said film receiving member, discrete apertured means slidably positioned on each of said open ended ducts, and means for simultaneously and continuously rotating said film receiving member and for moving said discrete apertured means parallel to the longitudinal axis of the film receiving member whereby vapor passing through the aperture of said discrete apertured means condenses as a film on the film receiving member.

2. An apparatus according to claim 1 wherein the dis crete apertured means comprises apertured shields, each shield being adapted to move on a rail along the longitudinal axis of the film receiving member, the apertures in the respective shields being offset axially to provide alternate film layers along the axis of the film receiving member.

References Cited UNITED STATES PATENTS 1,256,599 2/1918 Schoop 117-38 2,239,642 4/ 1941 Burkhardt et al.

2,421,343 5/ 1947 Mageoch.

2,432,659 12/1947 Criswell 118-301 X 2,702,760 2/1955 Barth 118504 X 2,799,600 7/1957 Scott 11849 X 3,041,194 6/1962 Rosen et al 117-38 3,110,620 11/1963 Bertelsen 11849.1 X

3,141,791 7/1964 Podolsky 118301 X 3,205,855 9/1965 Ault 11849 FOREIGN PATENTS 142,915 11/1953 Sweden.

MORRIS KAPLAN, Primary Examiner. 

1. AN APPARATUS FOR VACUUM DEPOSITING MULTIPLE LAYERS OF THIN FILMS IN THE ORDER OF 1000 TO 10,000 ANGSTROMS IN THICKNESS COMPRISING AN EVACUATED CONTAINER, A FILM RECEIVING MEMBER AXIALLY AND ROTATABLY MOUNTED WITHIN SAID CONTAINER, A PLURALITY OF VAPOR GENERATING SOURCES SPACED FROM SAID FILM RECEIVING MEMBER FOR GENERATING VAPORS ADAPTED TO BE DEPOSITED ON SAID FILM RECEIVING MEMBER AS SOLID LAYERS, EACH OF SAID VAPOR GENERATING SOURCES TERMINATING IN AN OPEN ENDED DUCT DIRCTED TOWARD AND COEXTENSIVE WITH SAID FILM RECEIVING MEMBER, DISCRETE APERTURED MEANS SLIDABLY POSITIONED ON EACH OF SAID OPEN ENDED DUCTS, AND MEANS FOR SIMULTANEOUSLY AND CONTINUOUSLY ROTATING SAID FILM RECEIVING MEMBER AND FOR MOVING SAID DISCRETE APERTURED MEANS PARALLEL TO THE LONGITUDINAL AXIS OF THE FILM RECEIVING MEMBER WHEREBY VAPOR PASSING THROUGH THE APERTURE OF SAID DISCRETE APERTURED MEANS CONDENSES AS A FILM ON THE FILM RECEIVING MEMBER. 